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dc.contributor.authorJõgi, Indrek
dc.date.accessioned2007-09-14T06:06:39Z
dc.date.available2007-09-14T06:06:39Z
dc.date.issued2007-09-14T06:06:39Z
dc.identifier.urihttp://hdl.handle.net/10062/3590
dc.language.isoenet
dc.titleConduction mechanisms in thin atomic layer deposited films containing TiO2et
dc.title.alternativeJuhtivusmehhanismid õhukest aatomkihtsadestatud TiO2 sisaldavates kilestruktuurideset
dc.typeThesiset


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