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dc.contributor.advisorKukli, Kaupo
dc.contributor.advisorTamm, Aile
dc.contributor.authorHoxha, Roland
dc.date.accessioned2014-09-11T07:46:43Z
dc.date.available2014-09-11T07:46:43Z
dc.date.issued2014
dc.identifier.urihttp://hdl.handle.net/10062/43373
dc.language.isoenet
dc.publisherTartu Ülikoolet
dc.titleSpectroskopic ellipsometry as a versatile tool to study thin films grown by atomic layer depositionet
dc.typeThesiset


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