Spectroskopic ellipsometry as a versatile tool to study thin films grown by atomic layer deposition
| dc.contributor.advisor | Kukli, Kaupo | |
| dc.contributor.advisor | Tamm, Aile | |
| dc.contributor.author | Hoxha, Roland | |
| dc.date.accessioned | 2014-09-11T07:46:43Z | |
| dc.date.available | 2014-09-11T07:46:43Z | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | http://hdl.handle.net/10062/43373 | |
| dc.language.iso | en | et |
| dc.publisher | Tartu Ülikool | et |
| dc.title | Spectroskopic ellipsometry as a versatile tool to study thin films grown by atomic layer deposition | et |
| dc.type | Thesis | et |