Optical anisotropy of glancing angle deposited thin films on nano-patterned substrates
| dc.contributor.author | Grineviciute, L. | |
| dc.contributor.author | Moein, T. | |
| dc.contributor.author | Han, M. | |
| dc.contributor.author | Ng, S.H. | |
| dc.contributor.author | Anand, V. | |
| dc.contributor.author | Katkus, T. | |
| dc.contributor.author | Ryu, M. | |
| dc.contributor.author | Morikawa, J. | |
| dc.contributor.author | Tobin, M.J | |
| dc.contributor.author | Vongsvivut, J. | |
| dc.contributor.author | Tolenis, T. | |
| dc.date.accessioned | 2023-07-05T07:14:28Z | |
| dc.date.available | 2023-07-05T07:14:28Z | |
| dc.date.issued | 2022 | |
| dc.description.abstract | This study has demonstrated that 3D columnar micro-films/coatings can be deposited over pre-patterned surfaces with sub-micrometer periodic patterns. Four-angle polarisation analysis of thin (0.4 − 1~μm) Si and SiO2 films, evaporated via glancing angle deposition (GLAD) at 70° to the normal, was carried out in reflection mode using synchrotron infrared microspectroscopy at the Australian Synchrotron. The angular dependence of absorbance followed A(θ) ∝ cos 2θ, confirmed for Si substrates patterned by electron beam lithography and plasma etching, which were used to make checkerboard patterns of Λ = 0.4~μm period on Si. Retardance control by birefringence of a patterned SiO2 substrate coated by columnar SiO2 is promising for UV-visible applications due to the use of the same material to endow polarisation control. | et |
| dc.identifier.uri | https://doi.org/10.1364/OME.451669 | |
| dc.identifier.uri | https://hdl.handle.net/10062/91319 | |
| dc.language.iso | eng | et |
| dc.publisher | Optica Publishing Group | et |
| dc.relation | info:eu-repo/grantAgreement/EC/H2020/857627///CIPHR | et |
| dc.rights | info:eu-repo/semantics/openAccess | et |
| dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 International | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
| dc.title | Optical anisotropy of glancing angle deposited thin films on nano-patterned substrates | et |
| dc.type | info:eu-repo/semantics/article | et |