Si-Cr Nano-Alloys Fabricated by Direct Femtosecond Laser Writing

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dc.contributor.authorMaksimovic, Jovan
dc.contributor.authorMu, Haoran
dc.contributor.authorHan, Molong
dc.contributor.authorSmith, Daniel
dc.contributor.authorKatkus, Tomas
dc.contributor.authorAnand, Vijayakumar
dc.contributor.authorNishijima, Yoshiaki
dc.contributor.authorHock Ng, Soon
dc.contributor.authorJuodkazis, Saulius
dc.date.accessioned2024-03-28T08:04:05Z
dc.date.available2024-03-28T08:04:05Z
dc.date.issued2023
dc.description.abstractUltra-short 230 fs laser pulses of 515 nm wavelength were tightly focused into 700 nm focal spots and utilised in opening ∼400 nm nano-holes in a Cr etch mask that was tens-of-nm thick. The ablation threshold was found to be 2.3 nJ/pulse, double that of plain silicon. Nano-holes irradiated with pulse energies below this threshold produced nano-disks, while higher energies produced nano-rings. Both these structures were not removed by either Cr or Si etch solutions. Subtle sub-1 nJ pulse energy control was harnessed to pattern large surface areas with controlled nano-alloying of Si and Cr. This work demonstrates vacuum-free large area patterning of nanolayers by alloying them at distinct locations with sub-diffraction resolution. Such metal masks with nano-hole opening can be used for formation of random patterns of nano-needles with sub-100 nm separation when applied to dry etching of Si.
dc.identifier.urihttps://doi.org/10.3390/ma16051917
dc.identifier.urihttps://hdl.handle.net/10062/97410
dc.language.isoen
dc.relationinfo:eu-repo/grantAgreement/EC/H2020/857627///CIPHR
dc.relation.ispartofMaterials 2023, 16(5), 1917
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subjectnano-alloy
dc.subjectSi-Cr
dc.subjectSi nano-needles
dc.subjectsub-100 nm
dc.subjectnanoscale
dc.titleSi-Cr Nano-Alloys Fabricated by Direct Femtosecond Laser Writing
dc.typeinfo:eu-repo/semantics/articleen

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