Atomic layer deposition of titanium, zirconium and hafnium dioxides: growth mechanisms and properties of thin films
| dc.contributor.author | Aarik, Jaan | |
| dc.date.accessioned | 2007-03-16T09:12:58Z | |
| dc.date.available | 2007-03-16T09:12:58Z | |
| dc.date.issued | 2007-03-16T09:12:58Z | |
| dc.identifier.uri | http://hdl.handle.net/10062/1918 | |
| dc.language.iso | en | en |
| dc.subject | chemistry | |
| dc.subject | thin films | |
| dc.title | Atomic layer deposition of titanium, zirconium and hafnium dioxides: growth mechanisms and properties of thin films | en |
| dc.type | Thesis | en |
| dc.type | doctoral thesis |