Atomic layer deposition of titanium, zirconium and hafnium dioxides: growth mechanisms and properties of thin films

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dc.contributor.authorAarik, Jaan
dc.date.accessioned2007-03-16T09:12:58Z
dc.date.available2007-03-16T09:12:58Z
dc.date.issued2007-03-16T09:12:58Z
dc.identifier.urihttp://hdl.handle.net/10062/1918
dc.language.isoenen
dc.subjectchemistry
dc.subjectthin films
dc.titleAtomic layer deposition of titanium, zirconium and hafnium dioxides: growth mechanisms and properties of thin filmsen
dc.typeThesisen
dc.typedoctoral thesis

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